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Thin film Spectroscopic

Reflectometer

Model: HO-ED-TH-04

Thin Film Spectroscopic Reflectometer is a fundamental instrument used for the analysis of thin film thickness in industry and research. Holmarc’s TFSR Model No: HO-ED-TH- 04 is able to analyze thin film’s thickness, complex refractive index and surface roughness with high speed and repeatability. TFSR theory works with complex matrix form of Fresnel equations for reflectance and transmittance. Absolute reflectance spectroscopy is the principle behind Reflectometer; which is the ratio of the intensity of the reflected light beam (usually monochromatic) to the intensity of the incident beam.

Light beam normally incident on the sample surface in turn reflect from top and bottom of the thin film surfaces which get interfered and is directed through optical fiber to CCD attached spectrometer via computer. On the monitor we get spectrogram with interference oscillations directly proportional to the thin film thickness.

Holmarc’s Reflectometer can be used to analyze single, multi-layer, free standing and rough layer thickness of various stacks such as di-electric, crystalline, amorphous, metallic and absorbing samples. It also finds absolute transmittance and absorption directly. Roughness treatment is done with EMA modeling. The instrument can also be used to find optical conductivity, molar refractivity and Brewster’s angle of sample under study.



Specification

    Film thickness rangee   :   25 nm - 1 μm

    Reflectance wavelength range   :   400 nm - 900 nm

    Transmittance / absorbance range   :   0 - 100%

    Light source   :   Tungsten Halogen Quartz Lamp, 50W

    Detector   :   CCD linear array, 3648 pixels

    Spectrometer   :   Spectra CDS 215

    Spectrometer wavelength range   :   VIS - NIR

    Standard sample   :   SiO2 thin film on NSF - 66 Substrate

    Optical fiber   :   Multimode Bi-furcated fiber with SMA fiber coupler

    EMA models   :   Linear EMA, Bruggemann, Maxwell Garnett, Lorentz - Lorenz models

    Precision typically for SiO2 on NSF - 66   :   ± 5 nm

    Accuracy for same sample   :   ± 10 nm

    Optical power   :   20 W

    Light spot size   :   1 mm

    Spot size on sample   :   5 mm

    Material library   :   Extendable material user library

    PC interface   :   RS232 / USB

    Standard sample   :   SiO2 thin film on NSF - 66 Substrate

    Reference sample   :   Enhanced silver with Yttrium & Bare Aluminum

    Measuring modes   :   Curve fitting / Regression Algorithms, FFT, FFT + Curve Fit

Features

    Analyze single or multi-layer films

    User extendable materials library

    Data can be saved as an Excel or text file

    Parameterized models

    Advanced mathematical fitting algorithm

    FFT based thickness measurement

    Extraction of thickness and optical constants

    Fiber optic probe for reflectance measurements at normal incident angle

    CCD linear array image sensor for simultaneous measurement of reflectance at each wavelength

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