Products    /    Analytical Instruments    /    Thin Film Spectroscopic Reflectometer
    Print

Thin Film Spectroscopic

Reflectometer
Model: HO-HAI-TFR-01SP
High speed & repeatability
Advanced mathematical fitting algorithm


Thin Film Spectroscopic Reflectometer is a fundamental instrument used for thin film thickness analysis for industry & research. Holmarc’s TFSR Model No: HO-HAI-TFR-01SP is able to analyze thin film’s thickness, complex refractive index & surface roughness with high speed & repeatability. TFSR theory works with complex matrix form of Fresnel equations for reflectance & transmittance. Absolute reflectance spectroscopy is the principle behind Reflectometer; which is the ratio of the intensity of the reflected light beam (usually monochromatic) to the intensity of the incident beam. Light beam which normally incidents on the sample surface in turn reflect from top & bottom of the thin film surfaces which get interfere & is directed through Optical fiber to CCD attached spectrometer via computer. On the monitor we get spectrogram with interference oscillations directly proportional to thin film thickness.

Holmarc’s Reflectometer can be used to analyze single, multilayer, free standing & rough layer thickness of various stacks such as di-electric, crystalline, amorphous, metallic & absorbing samples. Roughness treatment is done with EMA modeling.




    Film Thickness range :     20 nm - 35 μm
    Reflectance Wavelength range :     420 nm - 840 nm
    Light source :     Tungsten Halogen Quartz Lamp
    Detector :     CCD linear array, 3648 pixels
    Spectrometer :     Spectra CDS 215
    Spectrometer wavelength range :     VIS - NIR (420 nm - 840 nm)
    Precision typically for SiO2 on NSF - 66 :     ± 1 nm
    Accuracy for same sample :     ± 2 nm
    Optical Power :     20 W
    Spot size on sample :     2.5 mm (customized versions available)
    Optical fiber :     Multimode Bi-furcated fiber with SMA fiber coupler
    Reference Sample :     Polished NSF - 66 & NBK-7
    Standard Sample :     SiO2 thin film on NSF - 66 Substrate (3 Nos)
    Measuring modes :     Curve fitting / Regression Algorithms, FFT
    Dispersion formulas :     Cauchy’s, Sellmeiers & Empirical Models
    EMA models :     Linear EMA, Bruggemann, Maxwell Garnett, Lorentz - Lorenz models
    Material Library :     Extendable Material user library
    PC Interface :     USB


Features

    Analyze single and multi-layer films (indirect method for multi-layer films)

    Fiber optic probe for reflectance measurement at normal incident angle

    CCD linear array image sensor for simultaneous measurement of reflectance at each wavelength

    User extendable materials library

    Data can be saved as an Excel or text file

    Advanced mathematical fitting algorithm

    FFT based thickness measurement

    Extraction of thickness and optical constants

    Parameterized models


Home | Products | Supports | Company | Contact Us

Privacy Policy | Terms & Conditions


©2016 Holmarc Opto-Mechatronics (P) Ltd. All rights reserved.

Follow us