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Variable Angle Laser

Ellipsometer

Model: HO- ED-TH-02

The Variable Angle Laser Ellipsometer (Model No: HO-ED-TH-02) is designed to meet the requirements of modern research and studies. Ellipsometry is a very sensitive measurement technique that provide unequaled capabilities for thin film metrology. As an optical technique, ellipsometry is nondestructive and contact less. The optical thickness or refractive index of a thin film can be calculated by analyzing the polarization changes.

Holmarc's Ellipsometer provides easy operation, precise measurement and user friendly software. Students can gain deep knowledge in the working principles of Ellipsometer and its practical use.

First an input beam of random polarization is converted into a linearly polarized beam by making it pass through a polarizer. It is then converted to an elliptically polarized beam using a quarter wave plate and made incident on the thin film sample to be measured. The polarization status of the reflected beam from the film gets altered.



Experiment Examples

    Study of refractive index of thin films

Shafi



    Thickness of thin film samples

Shafi



Specification


    Measurement range   :   1 nm ~ 300 nm

    Incident angle   :   30° ~ 90°, Error 0.1

    DPSS laser   :   532 nm, 5 mW

    Si Photodiode   :   5.8 x 5.8 mm active area

Rotation range

    Polarizer   :   0° ~ 360°

    Quarter-wave   :   0° ~ 360°

    Analyzer   :   0° ~ 360°

    Laser arm   :   70° (from horizontal plane)

    Detector arm   :   70° (from horizontal plane)

    Resolution   :   0.1 degree

Ellipsometry measures the change of polarization upon reflection or transmission. Typically, ellipsometry is done only in reflection setup. The exact nature of the polarization change is determined by the analysis of the sample's properties like thickness, complex refractive index, etc. Although optical techniques are inherently diffraction limited, ellipsometry exploits phase information and polarization state of light and hence can achieve angstrom level resolution. In its simplest form, the technique is applicable to thin films with thickness less than a micrometer to several nanometers.


Related Topics

    Polarization of light

    Ellipsometry

    Quarter wave plate

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