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Variable Angle

Spectroscopic Ellipsometer

Model No: HO-SE-01
Thin Film Characterization
Non-destructive & Non-contact technique

Spectroscopic Ellipsometer is widely used for thin film analysis and measurements.

Holmarc’s spectroscopic ellipsometer incorporates Rotating Analyzer Ellipsometry technology to characterize thin film samples. It uses a high speed CCD array detection to collect the entire spectrum. It measures films from nanometer thickness up to tens of microns and the optical properties from transparent to absorbing materials. It accurately measures optical constants like refractive index, film thickness and extinction coefficient.

Our standard system comes with Quartz-Halogen lamp for visible through IR range. Our spectroscopic ellipsometer software allows the user to measure and analyze multilayer thin films and complex thin film structures.

An autocollimator, Z stage and tilt platforms are provided for sample alignment. XY motorized stage and motorized rotation stages are provided as unoptional feature for mapping thin film uniformity.

    Spectral Range  :  450 - 800nm
    Detector  :  Line CCD Camera
    Resolution  :  2nm
    Light Source  :  Halogen Lamp
    Incident Angle  :  50 - 75 degree (Resolution: 0.1 degree, Automated operation)
    Thickness Measurement Range  :  0.1nm - 10micron
    Resolution of film thickness  :  0.01nm
    Resolution of measured R.I.  :  0.001
    Sample alignment  :  Semi-automated (optical detection) with manual 10mm height adjustment and tilt
    Sample stage features  :  X - Y translation over 150 x 150mm (optional)
    Measurable film parameters  :  Refractive index, extinction coefficient, absorption coefficient and film thickness
    Software Features  :
    Acquisition and analysis of PSI, delta and reflectance at different wavelengths and angles
    User extendable materials library
    Data can be saved as an Excel or text file
    Advanced mathematical fitting algorithm
    Extraction of thickness and optical constants
    Parameterized models
    Multilayer thickness measurement

Fig. Optical Layout of Variable Angle Spectroscopic Ellipsometer

Principle of Ellipsometry

Ellipsometry is a highly sensitive technique for thin film analysis. The principle relies on the changes of the polarization state of light while reflecting from a surface.

To characterize the polarization state, corresponding to the direction of the electric field of the electromagnetic wave; two directions are chosen as reference, p-direction (parallel) and s-direction (perpendicular). The reflected light has phase changes that are different for p-direction and s-direction. Ellipsometry measure this state of polarization;

p  =  rp / rs  =  tan Ψe

Where Ψ and Δ are the amplitude ratio and phase shift of the p and s components respectively. Since ellipsometry is measuring the ratio of two values, it is very accurate and reproducible.


    Non-destructive and non-contact technique

    Analysis of single and multilayer samples

    Accurate measurements of ultra-thin films

    Software for measurement, modeling and automatic operations

    Uniform measurement sensitivity for (Ψ, Δ)

Ellipsometric Solutions

Need Customization for measurements. HOLMARC's experienced support engineers will be glad to help you. Call us at +91 484 2540075 or send us a mail to or

Holmarc can provide custom spectroscopic ellipsometers to fit a wide variety of applications.

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