INDIA | +91 - 484 - 2540075 |
Products / Analytical Instruments / Variable Angle Spectroscopic Ellipsometer
Analytical Instruments
Spectrophotometer
Double Beam Spectrophotometer
Theta 2 Theta Advanced
Spectrophotometer
Automatic Refractometer
Variable Angle
Spectroscopic Ellipsometer
Variable Angle
Laser Ellipsometer
Digital Polarimeter
Spectroscopic Polarimeter
Faraday Modulator
Contact Angle Meter
Contact Angle Meter
with RSH & AD
Contact Angle Meter with
RSH, AD & TC
Thin Film Spectroscopic
Reflectometer
Spectroscopic Magneto - Optic
Rotation Measurement System
UV-VIS Spectroscopic Magneto-
Optic Rotation Measurement System
UV-VIS Spectroscopic
Kerr / Faraday Fully Automated
Optical Rotation Test Station
High Sensitivity Laser Based
Magneto - Optical Kerr Effect Station
Variable Angle Spectroscopic Ellipsometer Print
Model No: HO-SE-01
Spectroscopic ellipsometer is widely used for thin film analysis and measurements. Holmarc’s spectroscopic ellipsometer incorporates Rotating Analyzer Ellipsometry technology to characterize thin film samples. It uses a high speed CCD array detection to collect the entire spectrum. It measures films from nanometer thickness up to tens of microns and the optical properties from transparent to absorbing materials. It accurately measures optical constants like refractive index, film thickness and extinction coefficient.
Our standard system comes with Quartz-Halogen lamp for visible through IR range. Our spectroscopic ellipsometer software allows the user to measure and analyze multilayer thin films and complex thin film structures. An autocollimator, Z stage and tilt platforms are provided for sample alignment. XY motorized stage and motorized rotation stages are provided as unoptional feature for mapping thin film uniformity.
Features
Non-destructive and non-contact technique
Analysis of single and multilayer samples
Accurate measurements of ultra-thin films
Software for measurement, modeling and
    automatic operations.
All range of (Ψ, Δ) can be measured.
Uniform measurement sensitivity for (Ψ, Δ)
Where Ψ and Δ are the amplitude ratio and phase shift of the p and s components respectively. Since ellipsometry is measuring the ratio of two values, it is very accurate and reproducible.
Principle of Ellipsometry
Ellipsometry is a highly sensitive technique for thin film analysis. The principle relies on the changes of the polarization state of light when reflecting from a surface. To characterize the polarization state, corresponding to the direction of the electric filed of the electromagnetic wave; two directions are chosen as reference, p-direction (parallel) and s-direction (perpendicular). The reflected light has phase changes that are different for p-direction and s-direction. Ellipsometry measure this state of polarization;
p = rp / rs = tan Ψe
 
 
  Spectral Range : 450 - 800nm
  Detector : CCD
  Resolution : 2nm
  Light Source : Halogen Lamp
  Goniometer : 40 - 90 degree
(Resolution: 0.1 degree, Automated operation)
  Thickness Measurement Range : 0.1nm - 10micron
  Resolution of film thickness : 0.01nm
  Resolution of measured R.I. : 0.001
  Sample alignment : Semi-automated (optical detection) with
manual 10mm height adjustment and tilt
  Sample stage features : X - Y translation over 10 x 10mm (optional)
  Measurable film parameters : Refractive index, extinction coefficient,
absorption coefficient and film thickness
  Software Features :
  Acquisition and analysis of psi, delta and reflectance at different wavelengths and angles
  User extendable materials library
  Data can be saved as an Excel or text file
  Advanced mathematical fitting algorithm
  Extraction of thickness and optical constants
  Parameterized models
  Multi layer thickness measurement
Downloads
Drawing
Because of continuous product improvement, the various data listed are subject to change without notice.
Click here for ENQUIRY
Home l Products l Supports l Company l Contact Us
Follow us
Privacy Policy l Terms & Conditions
© 2015 Holmarc Opto-Mechatronics (P) Ltd. All rights reserved.