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Variable Angle Spectroscopic Ellipsometer Print
Model No: HO-SE-01
Spectroscopic ellipsometer is widely used for thin film analysis and measurements. Holmarc’s spectroscopic ellipsometer incorporates Rotating Analyzer Ellipsometry technology to characterize thin film samples. It uses a high speed CCD array detection to collect the entire spectrum. It measures films from nanometer thickness up to tens of microns and the optical properties from transparent to absorbing materials. It accurately measures optical constants like refractive index, film thickness and extinction coefficient.
Our standard system comes with Quartz-Halogen lamp for visible through IR range. Our spectroscopic ellipsometer software allows the user to measure and analyze multilayer thin films and complex thin film structures. An autocollimator, Z stage and tilt platforms are provided for sample alignment. XY motorized stage and motorized rotation stages are provided as unoptional feature for mapping thin film uniformity.
Non-destructive and non-contact technique
Analysis of single and multilayer samples
Accurate measurements of ultra-thin films
Software for measurement, modeling and
    automatic operations.
All range of (Ψ, Δ) can be measured.
Uniform measurement sensitivity for (Ψ, Δ)
Where Ψ and Δ are the amplitude ratio and phase shift of the p and s components respectively. Since ellipsometry is measuring the ratio of two values, it is very accurate and reproducible.
Principle of Ellipsometry
Ellipsometry is a highly sensitive technique for thin film analysis. The principle relies on the changes of the polarization state of light when reflecting from a surface. To characterize the polarization state, corresponding to the direction of the electric filed of the electromagnetic wave; two directions are chosen as reference, p-direction (parallel) and s-direction (perpendicular). The reflected light has phase changes that are different for p-direction and s-direction. Ellipsometry measure this state of polarization;
p = rp / rs = tan Ψe
  Type : Rotating analyzer Ellipsometer (RAE)
  Spectral range : 450 - 1000 nm
  Resolution : 2 nm
  Light Source : Halogen Lamp
  Detector : Linear Array CCD
  Goniometer : 40 - 90 degree
  Goniometer resolution : 0.1 degree, Automated operation
  Thickness measurement range : 10 nm - 10 micron
  Resolution of measured Refractive index    :    0.001
  Sample alignment stage : Manual XYZ stage
  Sample alignment stage travel : 10 mm in X, Y and Z
  Measurement and data deduction : Software (SEllipso_V01)
  Measureable thin-film parameters :
  Refractive index, Extinction coefficient, absorption coefficient, film thickness, etc.
  Optical models
    Cauchy   Adachi
    Sellmeier   Cauchy - Lorentz
    Drude   Amorphous dispersion
    Lorentz - Drude   Sellmeier - Lorentz - Drude
    Brendel - Bormann   Cauchy - Urbach
  Surface roughness models Spectrometer
    Lorentz - Lorentz   Configuration    :    Concave grating spectrometer
    Bruggemann EMA   Ellipsometer output    :    400 micron 0.22 NA
    Linear EMA fiber with SMA connector
    Spectrometer input    :    Micrometer controlled slit
  with SMA connector
  Line Array CCD specs :
    CCD Sensor : B/W line sensor
    Number of pixels : 3648
    Pixel size : 8 * 200 micron
    Pixel output clock : 0.5 MHz
    External trigger : Yes
    ADC resolution : 16 bits
    Exposure time range : 0.1 ms - 6500 ms
    Frame rate : Opto 138 scans / second
    PC interface : USB 2.0
    Compatibility : Windows XP or higher
  Software Features :
  Acquisition and analysis of Psi, Delta and Reflectance at different wavelengths and angles
  User extendable materials library
  Data can be saved as an Excel or text file
  Advanced mathematical fitting algorithm
  Extraction of thickness and optical constants
  Parameterized models
  Multi layer thickness measurement
  Laptop    :    Windows OS
  Because of continuous product improvement, the various data listed are subject to change without notice.
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