One of the newest solution method for the deposition of thin film is Successive Ionic Layer Adsorption and Reaction (SILAR) method, which is also known as modified version of chemical bath deposition. As it is a chemical method, a large number of varieties of substrates can be coated.
Holmarc’s SILAR Coating System has been designed to automate the entire process to avoid operator fatigue and errors associated with it. In manual SILAR process, the operator has to perform hundreds of repetitive dipping into the solution and water. It is very difficult to control dip duration and number of dips in a manual process which can last hours. In the automated unit, the operator need just to clamp the substrate into the holder and program the controller with required dip cycles and duration.
In this model 4 beakers can be used. The dipping speed, dip duration, retrieval speed and dry duration can be set for each beaker. The rotation speed is programmable from 1 - 200 rpm. In this model there is no heater and stirrer. This is work at room temperature.
In this technique thin film is deposited on glass substrate following a chemical technique called successive ion layer adsorption and reaction (SILAR). The technique involves multiple dipping of the substrate in a given solution and deionized water.
|Drive mechanism||:||Lead screw|
|Dip duration||:||0 - 99 seconds / minutes / hours|
|No. of dips||:||1 - 999|
|Power input||:||230V, 50Hz|
|PC connectivity||:||Serial port (RS 232)|
|Stroke length||:||150 mm|
|Drawing Speed ( Manual mode )||:||400 - 9000 μm / s|
|Drawing Speed ( PC mode )||:||2 - 9000 μm / s|