Holmarc designed a versatile 4" substrate UV Laser Writer with high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photo sensitive layers.
System supporting up to 4096 levels of gray scale allows for 3D optical structures, surface structures as well as mask projects makes the system ideal Litho tool for R & D.
Laser | : | GaN laser diode |
Wavelength | : | 405 nm |
Spatial filtering unit | : | Objective lens based |
Spot size | : | 8 - 10um spot size with 60x objective |
Intensity | : | Max 3 mW in the spot software controlled |
Optical power feedback unit | : | Yes |
Focus control | : | Software controllable |
Light level control | : | 4096 levels |
X Y Scanning stage travel | : | 100 mm |
Resolution | : | 1 Micron |
Z axis travel | : | 20 mm |
Resolution | : | 1 micron |
Camera | : | 5 MP 1/2.5" CMOS camera |
Active Pixels | : | 2592H x 1944V |
Pixel Size | : | 2.2 um x 2.2 um |
Field of view (mm) | : | 2.5 x 1.9 mm |
Software | : | Image analysis software IMAGE Pro Ver. 2.25 |
Image processing | : | Background compensation, contrast enhancement and image filtering etc. |
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