Spectroscopic Ellipsometer is widely used for thin film analysis and measurements.
Holmarc’s spectroscopic ellipsometer incorporates Rotating Analyzer Ellipsometry technology to characterize thin film samples. It uses a high speed CCD array detection to collect the entire spectrum. It measures films from nanometer thickness up to tens of microns and the optical properties from transparent to absorbing materials. It accurately measures optical constants like refractive index, film thickness and extinction coefficient.
Our standard system comes with Quartz-Halogen lamp for visible through IR range. Our spectroscopic ellipsometer software allows the user to measure and analyze multilayer thin films and complex thin film structures.
An autocollimator, Z stage and tilt platforms are provided for sample alignment. XY motorized stage and motorized rotation stages are provided as unoptional feature for mapping thin film uniformity.
|Spectral Range : 450 - 800nm|
|Detector : Line CCD Camera|
|Resolution : 2nm|
|Light Source : Halogen Lamp|
|Incident Angle : 50 - 75 degree (Resolution: 0.1 degree, Automated operation)|
|Thickness Measurement Range : 0.1nm - 10micron|
|Resolution of film thickness : 0.01nm|
|Resolution of measured R.I. : 0.001|
|Sample alignment : Semi-automated (optical detection) with manual 10mm height adjustment and tilt|
|Sample stage features : X - Y translation over 150 x 150mm (optional)|
|Measurable film parameters : Refractive index, extinction coefficient, absorption coefficient and film thickness|
|Software Features :|
|Acquisition and analysis of PSI, delta and reflectance at different wavelengths and angles|
|User extendable materials library|
|Data can be saved as an Excel or text file|
|Advanced mathematical fitting algorithm|
|Extraction of thickness and optical constants|
|Multilayer thickness measurement|
Fig. Optical Layout of Variable Angle Spectroscopic Ellipsometer
Ellipsometry is a highly sensitive technique for thin film analysis. The principle relies on the changes of the polarization state of light while reflecting from a surface.
To characterize the polarization state, corresponding to the direction of the electric field of the electromagnetic wave; two directions are chosen as reference, p-direction (parallel) and s-direction (perpendicular). The reflected light has phase changes that are different for p-direction and s-direction. Ellipsometry measure this state of polarization;
p = rp / rs = tan Ψe iΔ
Where Ψ and Δ are the amplitude ratio and phase shift of the p and s components respectively. Since ellipsometry is measuring the ratio of two values, it is very accurate and reproducible.
Non-destructive and non-contact technique
Analysis of single and multilayer samples
Accurate measurements of ultra-thin films
Software for measurement, modeling and automatic operations
Uniform measurement sensitivity for (Ψ, Δ)
Holmarc can provide custom spectroscopic ellipsometers to fit a wide variety of applications.