Rubbing Machine has been developed for LCD R&D Labs. The system is intended for tracing grooves on the polyimide to orient the liquid crystal molecules. The grooves are made using a special rubbing cloth having depth of a few Angstrom. The substrate is held by a vacuum chuck for which a vacuum pump is included and integrated with the system. Maximum size of glass substrate which can be loaded is 100 mm x 100mm. The substrate along with vacuum chuck is held on a rotation stage so that it can be rotated and positioned at any required angle from 0 to 180 degrees for various rubbing orientations.
The system has been developed as a standalone unit in which speed of the roller and speed of the substrate can be varied.
|● Substrate holder|
|a) Motorized linear stage for substrate movement|
|b) Actuated by stepper motor|
|c) Travel||:||80 mm|
|d) Minimum speed||:||0.05 mm / sec|
|Maximum speed||:||9 mm / sec|
|e) Maximum size of movable substrate plate||:||100 mm x 100 mm|
|f) Substrate fixed on a rotation stage which can be rotated +/- 45 degree|
|● Rubbing wheel actuator||:||Brushless DC motor with speed control|
|Maximum speed||:||3000 rpm|
|Minimum speed||:||0 rpm|
|● Display of speed on LCD screen|
|● Speed control of the spindle by a knob|
|● Input||:||230 VAC|
|● The System can be used in standalone mode|
Rubbing Machine has been developed for LCD R&D Labs. The system is intended for tracing grooves on the polyimide to orient the liquid crystal molecules.
Holmarc Bench top rubbing machine is a compact dedicated machine specially designed for LCD and LCoS R&D Labs.