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UV Laser Writing System

for Photolithography

1 micron resolution
405 nm wavelength

Holmarc designed a versatile 4" substrate UV Laser Writer with high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photo sensitive layers.

System supporting up to 4096 levels of gray scale allows for 3D optical structures, surface structures as well as mask projects makes the system ideal Litho tool for R & D.


    Laser :     GaN laser diode
    Wavelength :     405 nm
    Spatial filtering unit :     Objective lens based
    Spot size :     1 Micron (Depend on objective)
    Intensity :     Max 3 mW in the spot software controlled
    Optical power feedback unit :     Yes
    Focus control :     Software controllable
    Light level control :     4096 levels
    X Y Scanning stage travel :     100 mm
    Resolution :     1 Micron
    Z axis travel :     20 mm
    Resolution :     1 micron

    Camera :     5 MP 1/2.5" CMOS camera
    Active Pixels :     2592H x 1944V
    Pixel Size :     2.2 um x 2.2 um
    Field of view (mm) :     2.5 x 1.9 mm
    Software :     Image analysis software IMAGE Pro Ver. 2.25
    Image processing :     Background compensation, contrast enhancement and image filtering etc.

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