Holmarc’s SILAR Controller with Overhead Stirrer, Model: HO-TH-03E has a motorized substrate holder which can be used to stir the solution. By rotating the substrate along with the holder at desired speed, the solution can be kept stirred during the dipping process. The rotation speed is programmable from 2 - 200 rpm. The dipping speed, dip duration, retrieval speed and dry duration can be set for each beaker. There is a controlled heater, which is common for 6 beakers and the temperature can be set up to 200°C from ambient. The device is compact and complete with a footprint of 376 x 330 mm.
Holmarc’s SILAR coating unit is an instrument with which a thin film is deposited on a glass substrate due to a chemical process called successive ion layer adsorption and reaction (SILAR). The technique involves multiple dipping of the substrate in a given solution and de-ionized water, temperature of both can vary from case to case.
SILAR coating system has been designed to automate the entire process to avoid operator fatigue and errors associated with it. In manual SILAR process, the operator has to perform hundreds of repetitive dipping into the solution and water.
It is very difficult to control dip duration and number of dips in a manual process which may last for hours. In our automated unit, all that an operator needs to do is just clamp the substrate on to the holder and program the controller with required parameters.
|Drive mechanism||:||Lead screw|
|Dip duration||:||0 - 99 seconds / minutes / hours|
|Number of dips||:||1 - 999|
|Hot plate temperature||:||Ambient to 200°C|
|Stirrer speed||:||Adjustable 2 rpm - 200 rpm|
|PC connectivity||:||Serial port (RS 232)|
|Stroke length||:||200 mm|
|Rotary speed||:||0 - 60 deg / sec|
|Drawing speed (Manual mode)||:||200 micron / sec - 16mm / sec|
|Drawing speed (PC mode)||:||2 - 16000 micron / sec|
|Stirrer speed||:||2 - 200 rpm|
|No. of position for beakers||:||6|
|No. of samples could be loaded||:||5|
|Temperature change from||:||80 to 200|
|Weight (appx.)||:||55 Kg|