One of the contemporary method for the deposition of thin film is Successive Ionic Layer Adsorption and Reaction (SILAR) method, which is also known as modified version of chemical bath deposition. As it is a chemical method, a large varieties of substrates can be coated.
Holmarc’s SILAR Coating System has been designed to automate the entire process to avoid operator fatigue and errors associated with it. In manual SILAR process, the operator has to perform hundreds of repetitive dipping into the solution and water. It is very difficult to control dip duration and number of dips in a manual process which can last hours. In the automated unit, the operator need just to clamp the substrate into the holder and program the controller with required dip cycles and duration.
In this model 4 beakers can be used. The dipping speed, dip duration, retrieval speed and dry duration can be set for each beaker. The rotation speed is programmable from 0 - 10 degree/sec. In this model there is no heater and stirrer. The process takes place at room temperature.
In this technique thin film is deposited on glass substrate following a chemical technique called successive ion layer adsorption and reaction (SILAR). The technique involves multiple dipping of the substrate in a given solution and deionized water. The technique involves multiple dipping of the substrate in a given solution and deionized water, temperature of both can vary from case to case.
|Drive mechanism||:||Lead screw|
|Dip duration||:||0 - 99 seconds / minutes / hours|
|Number of dips||:||1 - 999|
|Hot plate temperature||:||Ambient to 200°C|
|Stirrer speed||:||0 - 999 rpm|
|PC connectivity||:||Serial port (RS 232)|
|Stroke length||:||100 mm|
|Power input||:||230V, 50Hz|
|Weight (appx.)||:||130 Kg|